DocumentCode :
2746346
Title :
Minor Fe, Co, and Ni additions to SnAgCu solders for retarding Cu3Sn growth
Author :
Wang, Y.W. ; Kao, C.R.
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei
fYear :
2008
fDate :
22-24 Oct. 2008
Firstpage :
76
Lastpage :
79
Abstract :
The solders used for this study are Sn2.5Ag0.8Cu doped with 0.03 wt.% Fe, Co, or Ni and 0, 0.005, 0.01, 0.06, or 0.1 wt.% Ni. Reaction conditions included multiple reflows for up to 10 times and solid-state aging at 160degC for up to 2000 hrs. In multiple reflow study, Cu6Sn5 was the only reaction product observed for all the different solders used. Reflows using the solder without doping produced a thin, dense layer of Cu6Sn5. The additions of Fe, Co, or Ni transformed this microstructure into a much thicker Cu6Sn5 with many small trapped solder regions between the Cu6Sn5 grains. In solid state aging study, both Cu6Sn5 and Cu3Sn formed, but the additions of Fe, Co, or Ni produced a much thinner Cu3Sn layer. Specifically, Ni concentration higher than 0.01 wt.% could effectively retard the Cu3Sn growth even after 2000 hrs of aging, and accordingly 0.01 wt.% can be considered the minimum effective Ni addition. Because the Cu3Sn growth had been linked to the formation of micro voids, which in turn increased the potential for a brittle interfacial fracture, thinner Cu3Sn layers might translate into better solder joint strength.
Keywords :
ageing; alloying additions; brittle fracture; cobalt; copper alloys; crystal growth; crystal microstructure; doping; iron; nickel; silver alloys; solders; solid-state phase transformations; tin alloys; voids (solid); Cu3Sn; Cu6Sn5; Sn2.5Ag0.8Cu:Fe,Co,Ni; additions; brittle interfacial fracture; doping; microstructure; microvoids; multiple reflows; solder joint strength; solid-state aging; structural transformation; temperature 160 degC; time 2000 h; Aging; Environmentally friendly manufacturing techniques; Iron; Lead; Microstructure; Optical microscopy; Scanning electron microscopy; Soldering; Solid state circuits; Temperature; Diffusion; Intermetallics; Soldering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-3620-0
Electronic_ISBN :
978-1-4244-3621-7
Type :
conf
DOI :
10.1109/EMAP.2008.4784233
Filename :
4784233
Link To Document :
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