• DocumentCode
    2746346
  • Title

    Minor Fe, Co, and Ni additions to SnAgCu solders for retarding Cu3Sn growth

  • Author

    Wang, Y.W. ; Kao, C.R.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei
  • fYear
    2008
  • fDate
    22-24 Oct. 2008
  • Firstpage
    76
  • Lastpage
    79
  • Abstract
    The solders used for this study are Sn2.5Ag0.8Cu doped with 0.03 wt.% Fe, Co, or Ni and 0, 0.005, 0.01, 0.06, or 0.1 wt.% Ni. Reaction conditions included multiple reflows for up to 10 times and solid-state aging at 160degC for up to 2000 hrs. In multiple reflow study, Cu6Sn5 was the only reaction product observed for all the different solders used. Reflows using the solder without doping produced a thin, dense layer of Cu6Sn5. The additions of Fe, Co, or Ni transformed this microstructure into a much thicker Cu6Sn5 with many small trapped solder regions between the Cu6Sn5 grains. In solid state aging study, both Cu6Sn5 and Cu3Sn formed, but the additions of Fe, Co, or Ni produced a much thinner Cu3Sn layer. Specifically, Ni concentration higher than 0.01 wt.% could effectively retard the Cu3Sn growth even after 2000 hrs of aging, and accordingly 0.01 wt.% can be considered the minimum effective Ni addition. Because the Cu3Sn growth had been linked to the formation of micro voids, which in turn increased the potential for a brittle interfacial fracture, thinner Cu3Sn layers might translate into better solder joint strength.
  • Keywords
    ageing; alloying additions; brittle fracture; cobalt; copper alloys; crystal growth; crystal microstructure; doping; iron; nickel; silver alloys; solders; solid-state phase transformations; tin alloys; voids (solid); Cu3Sn; Cu6Sn5; Sn2.5Ag0.8Cu:Fe,Co,Ni; additions; brittle interfacial fracture; doping; microstructure; microvoids; multiple reflows; solder joint strength; solid-state aging; structural transformation; temperature 160 degC; time 2000 h; Aging; Environmentally friendly manufacturing techniques; Iron; Lead; Microstructure; Optical microscopy; Scanning electron microscopy; Soldering; Solid state circuits; Temperature; Diffusion; Intermetallics; Soldering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-3620-0
  • Electronic_ISBN
    978-1-4244-3621-7
  • Type

    conf

  • DOI
    10.1109/EMAP.2008.4784233
  • Filename
    4784233