Direct Formation Of Silicon Dioxide Mask Using A Novel Radiation-Sensitive Spin-on-Glass

Author

Sakata, M. ; Ito, T. ; Endo, A. ; Jinbo, H. ; Ashida, I.

Author_Institution

Oki Electric Industry Co. Ltd.

fYear

1993

fDate

17-19 May 1993

Firstpage

147

Lastpage

148

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on

Conference_Location

Kyoto, Japan

Type

DOI

10.1109/VLSIT.1993.760291

Filename

760291

Link To Document