مرکز منطقه ای اطلاع رساني علوم و فناوري - Lissajous Electron Plasma Etching For Sub-half Micron LSI

DocumentCode :

2746593

Title :

Lissajous Electron Plasma Etching For Sub-half Micron LSI

Author :

Ohkuni, M. ; Kubota, M. ; Nakayama, I. ; Eriguchi, K. ; Tamaki, T. ; Harafuji, K. ; Nomura, N. ; Sivaram, S.

Author_Institution :

Matsushita Electric Ind. Co.,Ltd

fYear :

1993

fDate :

17-19 May 1993

Firstpage :

151

Lastpage :

152

fLanguage :

English

Publisher :

ieee

Conference_Titel :

VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on

Conference_Location :

Kyoto, Japan

Type :

conf

DOI :

10.1109/VLSIT.1993.760293

Filename :

760293

Link To Document :