DocumentCode :
2746628
Title :
Effect of alloying W in Ni(5P) metallization of solder joints
Author :
Jang, D.M. ; Yu, Jin
Author_Institution :
Dept. Mater. Sci.&Eng., Korea Adv. Inst. Sci.&Tech., Daejeon
fYear :
2008
fDate :
22-24 Oct. 2008
Firstpage :
141
Lastpage :
144
Abstract :
As lead free solders are being implemented in commercial electronic goods, reliability of electroless Ni(P)/Pb-free solder joint has become an important issue because formation of Ni3P and Ni3SnP at solder/UBM interface increased the susceptibility to brittle cracking through these layers. In this report, composition of electroless Ni(P) under bump metallization(UBM) was modified by co-depositing W, and interfacial reactions between electroless Ni-5P-xW and Sn-3.5Ag solder were investigated using SEM and XRD. Results indicate that addition of W to the electroless Ni(5P) layer suppressed the formation of Ni3Sn4, increased the temperate of Ni3P formation, and increased the crystallinity of Ni-5P-xW film.
Keywords :
X-ray diffraction; alloying additions; metallic thin films; metallisation; nickel alloys; phosphorus alloys; scanning electron microscopy; silver alloys; solders; tin alloys; tungsten alloys; NiPW; SEM; SnAg; XRD; alloying; brittle cracking; crystallinity; electroless under bump metallization; film; interfacial reactions; solder joints; Alloying; Crystallization; Lead; Magnetic films; Metallization; Nickel; Performance analysis; Scanning electron microscopy; Soldering; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-3620-0
Electronic_ISBN :
978-1-4244-3621-7
Type :
conf
DOI :
10.1109/EMAP.2008.4784249
Filename :
4784249
Link To Document :
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