• DocumentCode
    2747055
  • Title

    Drop impact reliability of Cu-Zn/Sn-Ag-Cu/Cu-Zn solder joints

  • Author

    Kim, Young Min ; Kim, Young-Ho

  • Author_Institution
    Div. of Mater. Sci. & Eng., Hanyang Univ., Seoul, South Korea
  • fYear
    2008
  • fDate
    22-24 Oct. 2008
  • Firstpage
    236
  • Lastpage
    238
  • Abstract
    The intermetallic growth in the Sn-Ag-Cu (SAC) solder joints fabricated on Cu or Cu-Zn solder wetting layer and its effect on the drop impact reliability have been studied. The drop test specimens were fabricated by connecting two printed circuit boards by reflowing SASC 405 solder balls on Cu or Cu-Zn wetting layers. And the drop test specimens were aged at 150degC up to 500 hrs. The well known bi-layer of Cu6Sn5 and Cu3Sn with microvoids was formed at the SAC/Cu interfaces during aging. On the other hand, only Cu6Sn5 formed at the SAC/Cu-Zn interfaces with aging. No Cu3Sn and microvoids were observed and the formation of large Ag3Sn plates was suppressed remarkably. Also, the growth rate of IMCs at the SAC/Cu-Zn interface was much slower than that at the SAC/Cu interface. The number of drops to failure in the Cu-Zn/SAC/Cu-Zn solder joints was higher than that in the Cu/SAC/Cu solder joints before and after aging. The microstructure developed in the solder interfaces greatly influenced the drop impact reliability.
  • Keywords
    copper alloys; materials testing; reliability; silver alloys; solders; tin alloys; zinc alloys; Cu-Zn-Sn-Ag-Cu-Cu-Zn; Cu-Zn/Sn-Ag-Cu/Cu-Zn solder joints; Cu3Sn; Cu6Sn5; Drop impact reliability; SAC/Cu interfaces; Sn-Ag-Cu solder; bi-layer; drop test; failure; intermetallic growth; microstructure; microvoids; wetting layer; Aging; Circuit testing; Copper alloys; Intermetallic; Materials reliability; Optical microscopy; Printed circuits; Scanning electron microscopy; Soldering; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-3620-0
  • Electronic_ISBN
    978-1-4244-3621-7
  • Type

    conf

  • DOI
    10.1109/EMAP.2008.4784272
  • Filename
    4784272