Title :
Evaluation of low-ohmic resistance measurement capabilities between VSL and NIST
Author :
Rietveld, Gert ; Van der Beek, Jan ; Kraft, Marlin
Author_Institution :
VSL, Delft, Netherlands
Abstract :
The low-ohmic resistance measurement capabilities of the Van Swinden Laboratorium (VSL) and the National Institute of Standards and Technology (NIST) were compared using a set of resistors with values 100 mΩ, 10 mΩ, 1 mΩ, and 100 μΩ respectively. The measurement data of both laboratories generally agree well within the combined measurement uncertainties, ranging from 0.54 μΩ/Ω at 100 mΩ to 4.3 μΩ/Ω at 100 μΩ (k = 2). Careful transport of the resistors was crucial for achieving this result.
Keywords :
electric resistance measurement; resistors; NIST; VSL; Van Swinden Laboratorium; low-ohmic resistance measurement capability; measurement uncertainties; resistance 1 mohm; resistance 10 mohm; resistance 100 mohm; resistance 100 muohm; resistors; Current measurement; Electrical resistance measurement; Measurement uncertainty; NIST; Resistance; Resistors; Temperature measurement; comparison; low-ohmic measurements; precision measurements; resistance measurements resistors; shunts;
Conference_Titel :
Precision Electromagnetic Measurements (CPEM), 2012 Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4673-0439-9
DOI :
10.1109/CPEM.2012.6250868
