DocumentCode :
2748588
Title :
Laser interferometry in the Si lattice-parameter measurement
Author :
Massa, E. ; Mana, G.
Author_Institution :
INRIM - Ist. Naz. di Ricerca Metrol., Torino, Italy
fYear :
2012
fDate :
1-6 July 2012
Firstpage :
352
Lastpage :
353
Abstract :
Future measurements of the silicon lattice-parameter by combined X-ray and optical interferometry require displacement measurements having 10-9 relative accuracy. Experimental and numerical investigations are under way to bring into light the limiting factors, excluding or identifying and eliminating them.
Keywords :
displacement measurement; light interferometry; silicon; Si; X-ray interferometry; displacement measurements; laser interferometry; lattice-parameter measurement; optical interferometry; Interference; Laser beams; Measurement by laser beam; Optical interferometry; Silicon; Wavelength measurement; X-ray lasers; X-ray diffraction; crystallography; laser beams; measurement; metrology; optical interferometry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements (CPEM), 2012 Conference on
Conference_Location :
Washington, DC
ISSN :
0589-1485
Print_ISBN :
978-1-4673-0439-9
Type :
conf
DOI :
10.1109/CPEM.2012.6250947
Filename :
6250947
Link To Document :
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