• DocumentCode
    2748855
  • Title

    Optical exposure systems for three-dimensional fabrication of microprobe

  • Author

    Esashi, Masayoshi ; Minami, Kazuyuki ; Shoji, Shuichi

  • Author_Institution
    Fac. of Eng., Tohoku Univ., Sendai, Japan
  • fYear
    1991
  • fDate
    30 Jan-2 Feb 1991
  • Firstpage
    39
  • Lastpage
    44
  • Abstract
    New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer laser. Microprobe multielectrodes for recording neuron impulses were fabricated with the photoresist exposure system. However, this method has the disadvantage that it is difficult to coat a nonplanar surface with photoresist uniformly. It is demonstrated that Parylene can be coated uniformly on a nonplanar surface and be patterned by a Parylene laser ablation system. A Cr line with a 10 μm width on a glass plate was patterned by Parylene laser ablation and the subsequent lift-off technique. This process is useful for patterning thin film on nonplanar surfaces
  • Keywords
    electrodes; excimer lasers; laser beam applications; photolithography; probes; vapour deposition; Cr line; KrF excimer laser; Parylene laser ablation system; lift-off technique; microprobe; multielectrodes; neuron impulses; nonplanar surfaces; optical exposure systems; photoresist exposure system; three-dimensional fabrication; Chromium; Glass; Laser ablation; Neurons; Optical device fabrication; Optical films; Optical recording; Resists; Surface emitting lasers; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
  • Conference_Location
    Nara
  • Print_ISBN
    0-87942-641-1
  • Type

    conf

  • DOI
    10.1109/MEMSYS.1991.114766
  • Filename
    114766