Title :
Optical exposure systems for three-dimensional fabrication of microprobe
Author :
Esashi, Masayoshi ; Minami, Kazuyuki ; Shoji, Shuichi
Author_Institution :
Fac. of Eng., Tohoku Univ., Sendai, Japan
fDate :
30 Jan-2 Feb 1991
Abstract :
New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer laser. Microprobe multielectrodes for recording neuron impulses were fabricated with the photoresist exposure system. However, this method has the disadvantage that it is difficult to coat a nonplanar surface with photoresist uniformly. It is demonstrated that Parylene can be coated uniformly on a nonplanar surface and be patterned by a Parylene laser ablation system. A Cr line with a 10 μm width on a glass plate was patterned by Parylene laser ablation and the subsequent lift-off technique. This process is useful for patterning thin film on nonplanar surfaces
Keywords :
electrodes; excimer lasers; laser beam applications; photolithography; probes; vapour deposition; Cr line; KrF excimer laser; Parylene laser ablation system; lift-off technique; microprobe; multielectrodes; neuron impulses; nonplanar surfaces; optical exposure systems; photoresist exposure system; three-dimensional fabrication; Chromium; Glass; Laser ablation; Neurons; Optical device fabrication; Optical films; Optical recording; Resists; Surface emitting lasers; Transistors;
Conference_Titel :
Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
Conference_Location :
Nara
Print_ISBN :
0-87942-641-1
DOI :
10.1109/MEMSYS.1991.114766