DocumentCode
2748855
Title
Optical exposure systems for three-dimensional fabrication of microprobe
Author
Esashi, Masayoshi ; Minami, Kazuyuki ; Shoji, Shuichi
Author_Institution
Fac. of Eng., Tohoku Univ., Sendai, Japan
fYear
1991
fDate
30 Jan-2 Feb 1991
Firstpage
39
Lastpage
44
Abstract
New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer laser. Microprobe multielectrodes for recording neuron impulses were fabricated with the photoresist exposure system. However, this method has the disadvantage that it is difficult to coat a nonplanar surface with photoresist uniformly. It is demonstrated that Parylene can be coated uniformly on a nonplanar surface and be patterned by a Parylene laser ablation system. A Cr line with a 10 μm width on a glass plate was patterned by Parylene laser ablation and the subsequent lift-off technique. This process is useful for patterning thin film on nonplanar surfaces
Keywords
electrodes; excimer lasers; laser beam applications; photolithography; probes; vapour deposition; Cr line; KrF excimer laser; Parylene laser ablation system; lift-off technique; microprobe; multielectrodes; neuron impulses; nonplanar surfaces; optical exposure systems; photoresist exposure system; three-dimensional fabrication; Chromium; Glass; Laser ablation; Neurons; Optical device fabrication; Optical films; Optical recording; Resists; Surface emitting lasers; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
Conference_Location
Nara
Print_ISBN
0-87942-641-1
Type
conf
DOI
10.1109/MEMSYS.1991.114766
Filename
114766
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