DocumentCode
2749529
Title
Fabrication of Ge-rich SiGe-On-insulator waveguide for optical modulator
Author
Kim, Younghyun ; Yokoyama, Masafumi ; Taoka, Noriyuki ; Takenaka, Mitsuru ; Takagi, Shinichi
Author_Institution
Dept. of Electr. Eng. & Inf. Syst., Univ. of Tokyo, Tokyo, Japan
fYear
2011
fDate
9-13 Oct. 2011
Firstpage
465
Lastpage
466
Abstract
We have demonstrated the fabrication of Ge-rich SGOI wafer by Ge condensation and regrowth technique to en-hance free carrier plasma dispersion for waveguide optical modulators. The Ge-rich SGOI was successfully fabricated without any thick buffer layers. The presented fabrication process is CMOS compatible and highly promising for high-performance SiGe optical modulators.
Keywords
CMOS integrated circuits; Ge-Si alloys; condensation; integrated optics; optical dispersion; optical fabrication; optical modulation; optical waveguides; silicon-on-insulator; CMOS compatible process; SiGe; SiGe-on-insulator waveguide; condensation; free carrier plasma dispersion; optical modulator; regrowth technique; waveguide optical modulators; Dispersion; Modulation; Optical buffering; Optical device fabrication; Optical waveguides; Plasmas; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Conference (PHO), 2011 IEEE
Conference_Location
Arlington, VA
Print_ISBN
978-1-4244-8940-4
Type
conf
DOI
10.1109/PHO.2011.6110628
Filename
6110628
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