DocumentCode
2750152
Title
Influence of backside doping on the nonlinear capacitances of a PHEMT affecting the VCO frequency characteristics
Author
Brech, H. ; Grave, T. ; Werthof, A. ; Siweris, H.J. ; Simlinger, T. ; Selberherr, S.
Author_Institution
Corp. Technol., Siemens AG, Munich, Germany
fYear
1997
fDate
8-11 Sep 1997
Firstpage
495
Lastpage
498
Abstract
A local maximum in the CGS(VGS) characteristics of an AlGaAs/InGaAs/AlGaAs PHEMT is both calculated by hydrodynamic simulations and extracted from S-parameter measurements. It is found by simulation that the doping on the backside of the channel is the origin of this behavior. VCO measurements demonstrated that this C GS(VGS) characteristic can result in a partially reversed tuning behavior
Keywords
III-V semiconductors; S-parameters; aluminium compounds; capacitance; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; AlGaAs-InGaAs-GaAs; PHEMT; S-parameter; VCO frequency characteristics; backside doping; hydrodynamic simulations; nonlinear capacitance; partially reversed tuning; Capacitance; Circuit simulation; Doping; Frequency; HEMTs; Hydrodynamics; Indium gallium arsenide; MODFETs; PHEMTs; Voltage-controlled oscillators;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors, 1997 IEEE International Symposium on
Conference_Location
San Diego, CA
Print_ISBN
0-7503-0556-8
Type
conf
DOI
10.1109/ISCS.1998.711723
Filename
711723
Link To Document