• DocumentCode
    2751682
  • Title

    Comparison of the effects of different lateral boundary conditions on transport in resonant tunneling diodes

  • Author

    Hunter, A.T. ; Schulman, J.N.

  • Author_Institution
    Hughes Res. Labs., Malibu, CA, USA
  • fYear
    1997
  • fDate
    8-11 Sep 1997
  • Firstpage
    581
  • Lastpage
    584
  • Abstract
    Small resonant tunneling diodes (RTDs) will be required to achieve high speed with low power dissipation. We have modeled transport in RTDs including lateral boundary conditions, and find that the peak-to-valley-current ratio of small RTDs can be significantly degraded. For an example in which p-type regions were used to restrict the electron current to the central 200 nm of the RTD, the peak-to-valley-current ratio was reduced to 2.8:1 from 26:1 calculated for a large area device. Similar, but smaller, effects were calculated when semi-insulating regions (as might be produced by a damage implant) were used to define the device area
  • Keywords
    resonant tunnelling diodes; semiconductor device models; RTDs; damage implant; different lateral boundary conditions; electron current; high speed; large area device; lateral boundary conditions; low power dissipation; modelling; p-type regions; peak-to-valley-current ratio; resonant tunneling diodes; semi-insulating regions; transport; Boundary conditions; Degradation; Diodes; Electrons; Electrostatics; Laboratories; Physics; Power dissipation; Resonance; Resonant tunneling devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductors, 1997 IEEE International Symposium on
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    0-7503-0556-8
  • Type

    conf

  • DOI
    10.1109/ISCS.1998.711744
  • Filename
    711744