Title :
Scalable Talbot lithography with an extreme ultraviolet table top laser
Author :
Urbanski, L. ; Wachulak, P. ; Isoyan, A. ; Stein, A. ; Menoni, C.S. ; Rocca, J.J. ; Marconi, M.
Author_Institution :
NSF ERC for Extreme Ultraviolet Sci. & Technol., Colorado State Univ. Fort Collins, Fort Collins, CO, USA
Abstract :
We present a size scalable nano-patterning scheme based on the Talbot effect with extreme ultraviolet laser illumination.
Keywords :
Talbot effect; gas lasers; nanopatterning; ultraviolet lithography; Talbot effect; extreme ultraviolet laser illumination; extreme ultraviolet table top laser; scalable Talbot lithography; size scalable nanopatterning; Imaging; Laser beams; Lighting; Lithography; Nanofabrication; Resists; Ultraviolet sources;
Conference_Titel :
Photonics Conference (PHO), 2011 IEEE
Conference_Location :
Arlington, VA
Print_ISBN :
978-1-4244-8940-4
DOI :
10.1109/PHO.2011.6110819
