Title :
Contact Length Scaling in Staggered Organic Thin-Film Transistors
Author :
Hong Wang ; Wei Wang ; Pengxiao Sun ; Xiaohua Ma ; Ling Li ; Ming Liu ; Yue Hao
Author_Institution :
Sch. of Adv. Mater. & Nanotechnol., Xidian Univ., Xi´an, China
Abstract :
In this letter, the contact length (source and drain electrodes length) scaling potential in staggered organic thin-film transistors (OTFTs) was studied. We performed the effect of gate-source voltage, channel length, semiconductor film thickness, mobility, material disorder, anisotropy of mobility, and Schottky barrier between organic semiconductor and source/drain electrodes on the contact length downscaling, and found that the contact resistance do not increase until the contact length is scaled down to sub-500 nm. Importantly, the cutoff frequency (fT) of OTFTs was described and it was found that fT would increase with the decrease of contact length and the highest fT could be obtained with contact length in the range of sub-100 nm with Ohmic contacts. This letter showed excellent contact length scaling potential of OTFTs and provided guidelines for the design of high frequency, low-cost, and printable OTFTs.
Keywords :
Schottky barriers; contact resistance; electrodes; ohmic contacts; organic field effect transistors; thin film transistors; OTFT; Schottky barrier; channel length; contact length scaling; contact resistance; cutoff frequency; drain electrode; gate-source voltage; material disorder; ohmic contact; semiconductor film thickness; source electrode; staggered organic thin-film transistor; Contact resistance; Logic gates; Mathematical model; Organic semiconductors; Organic thin film transistors; Schottky barriers; Organic thin film transistor (OTFT); contact length; contact resistance; cutoff frequency; organic thin film transistor (OTFT);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2015.2423000