DocumentCode :
2759300
Title :
The mechanism of clearing in metalized film capacitors
Author :
Qin, Shanshan ; Ma, Shilei ; Boggs, Steven A.
Author_Institution :
Inst. of Mater. Sci., Univ. of Connecticut, Storrs, CT, USA
fYear :
2012
fDate :
10-13 June 2012
Firstpage :
592
Lastpage :
595
Abstract :
Self clearing in metallized film capacitors results in gradual failure from capacitance loss rather than sudden failure after the first breakdown. During clearing, the arc normally extinguishes with little change in the potential across the capacitor, i.e., the source potential (and impedance) for the clearing discharge is approximately constant. Usually an arc driven by constant source potential and impedance does not extinguish, and the reasons that this is not the case in self-clearing remain obscure. Applied voltage, interfacial pressure, and metallization resistance are generally considered the most important factors which influence the clearing process. We analyze the clearing process in the context of energy loss from the arc and physical processes related to gaseous products created by the arc. Increase of arc resistance and cooling of the arc as it lengthens contribute to clearing.
Keywords :
arcs (electric); metallisation; thin film capacitors; arc resistance; capacitance loss; clearing discharge; electric breakdown; energy loss; gradual failure; interfacial pressure; metalized film capacitors; metallization resistance; self clearing; source potential; Capacitors; Electric breakdown; Electrodes; Films; Metallization; Resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation (ISEI), Conference Record of the 2012 IEEE International Symposium on
Conference_Location :
San Juan, PR
ISSN :
1089-084X
Print_ISBN :
978-1-4673-0488-7
Electronic_ISBN :
1089-084X
Type :
conf
DOI :
10.1109/ELINSL.2012.6251539
Filename :
6251539
Link To Document :
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