• DocumentCode
    2760160
  • Title

    IR drop analysis in single- and multi-wall carbon nanotube power interconnects in sub-nanometer designs

  • Author

    Das, Debaprasad ; Rahaman, Hafizur

  • Author_Institution
    Sch. of VLSI Technol., Bengal Eng. & Sci. Univ., Shibpur, India
  • fYear
    2011
  • fDate
    19-20 July 2011
  • Firstpage
    174
  • Lastpage
    183
  • Abstract
    This paper presents a detailed analysis of the power supply voltage (IR) drop in sub-nanometer designs for local, semi-global, and global lengths. The IR drop in carbon nanotube (CNT) based power interconnects is analyzed and their effects on the timing delay have been investigated. It is shown that the CNT based power interconnects have significantly less IR-drop in comparison to that of Cu based power interconnects for semi-global and global lengths. The interconnect delay is increased by almost ten times for ten fold increase in interconnect length due to IR-drop in Cu wires, whereas that of MWCNT based wires is only ~50% for global lengths.
  • Keywords
    VLSI; carbon nanotubes; integrated circuit interconnections; IR drop analysis; MWCNT; VLSI; multi-wall carbon nanotube; power interconnects; single-wall carbon nanotube; sub-nanometer designs; Copper; Inductance; Integrated circuit interconnections; Quantum capacitance; Resistance; Carbon Nanotube (CNT); IR drop; Interconnect delay; Multi-wall Carbon Nanotube (MWCNT); Single-wall Carbon Nanotube (SWCNT);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design (ASQED), 2011 3rd Asia Symposium on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4577-0145-0
  • Type

    conf

  • DOI
    10.1109/ASQED.2011.6111741
  • Filename
    6111741