DocumentCode
2760160
Title
IR drop analysis in single- and multi-wall carbon nanotube power interconnects in sub-nanometer designs
Author
Das, Debaprasad ; Rahaman, Hafizur
Author_Institution
Sch. of VLSI Technol., Bengal Eng. & Sci. Univ., Shibpur, India
fYear
2011
fDate
19-20 July 2011
Firstpage
174
Lastpage
183
Abstract
This paper presents a detailed analysis of the power supply voltage (IR) drop in sub-nanometer designs for local, semi-global, and global lengths. The IR drop in carbon nanotube (CNT) based power interconnects is analyzed and their effects on the timing delay have been investigated. It is shown that the CNT based power interconnects have significantly less IR-drop in comparison to that of Cu based power interconnects for semi-global and global lengths. The interconnect delay is increased by almost ten times for ten fold increase in interconnect length due to IR-drop in Cu wires, whereas that of MWCNT based wires is only ~50% for global lengths.
Keywords
VLSI; carbon nanotubes; integrated circuit interconnections; IR drop analysis; MWCNT; VLSI; multi-wall carbon nanotube; power interconnects; single-wall carbon nanotube; sub-nanometer designs; Copper; Inductance; Integrated circuit interconnections; Quantum capacitance; Resistance; Carbon Nanotube (CNT); IR drop; Interconnect delay; Multi-wall Carbon Nanotube (MWCNT); Single-wall Carbon Nanotube (SWCNT);
fLanguage
English
Publisher
ieee
Conference_Titel
Quality Electronic Design (ASQED), 2011 3rd Asia Symposium on
Conference_Location
Kuala Lumpur
Print_ISBN
978-1-4577-0145-0
Type
conf
DOI
10.1109/ASQED.2011.6111741
Filename
6111741
Link To Document