DocumentCode :
2761942
Title :
An Analytic Solution of Channel Potential and Drain Current for an Undoped Symmetric DG MOSFET Using SiO2 and High K Gate Dielectrics
Author :
Baruah, Ratul Kr ; Das, Sunando ; Saikia, Pallabjyoti ; Deka, Himangshu
Author_Institution :
Dept. of ECE, Tezpur (Central) Univ., Tezpur, India
fYear :
2011
fDate :
8-10 Dec. 2011
Firstpage :
1
Lastpage :
5
Abstract :
In this work, we have presented a new analytical potential and current model for an undoped symmetric double- gate (DG) MOSFET which is valid from low to high drain-source voltages. The models are derived from an analytical solution of 2-D Poisson´s equation. From the analytic solutions, explicit expressions for potential, electric field, mobile charge density and current have been derived. Simulations are done with the gate material SiO2 (k = 3.9) and high k dielectric material HfO2 (k = 22). Our results are in close agreement to the numeric device simulator ATLAS as well as other published and experimental results.
Keywords :
MOSFET; Poisson equation; high-k dielectric thin films; 2D Poisson equation; ATLAS numeric device simulator; channel potential; double-gate MOSFET; drain current; drain-source voltages; electric field; gate material; high-K gate dielectrics; mobile charge density; potential; undoped symmetric DG MOSFET; Analytical models; Electric potential; Logic gates; MOSFET circuits; Mathematical model; Poisson equations; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoscience, Technology and Societal Implications (NSTSI), 2011 International Conference on
Conference_Location :
Bhubaneswar
Print_ISBN :
978-1-4577-2035-2
Type :
conf
DOI :
10.1109/NSTSI.2011.6112000
Filename :
6112000
Link To Document :
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