DocumentCode :
2765119
Title :
Electroluminescence from the Ge Quantum Dot Metal-Oxide-Semiconductor Tunneling Diodes
Author :
Liao, M.H. ; Cheng, T.-H. ; Chen, T.C. ; Lai, Chi-Hui ; Lee, Chia-Han ; Liu, C.W.
Author_Institution :
Dept. of Electr. Eng. & Graduate Inst. of Electro-Opt. Eng., National Taiwan Univ., Taipei
fYear :
2006
fDate :
15-17 May 2006
Firstpage :
1
Lastpage :
2
Abstract :
In summary, the ~1.5 mum Ge QD MOS LED which is fully compatible with ULSI process is reported for the first time. The origin of the emission is due to the radiative recombination between the electrons and holes confined in the Ge QD. The electrons also recombined with holes at the Si/oxide interface and the band edge light emission from Si is also observed
Keywords :
MIS devices; electroluminescence; electron-hole recombination; elemental semiconductors; germanium; light emitting diodes; semiconductor quantum dots; silicon; tunnel diodes; Ge; QD MOS LED device; Si; ULSI process; band edge light emission; electroluminescence; metal-oxide-semiconductor tunneling diodes; quantum dots; radiative recombination; Electroluminescence; Infrared detectors; Light emitting diodes; P-i-n diodes; Quantum dots; Temperature; Tunneling; US Department of Transportation; Ultra large scale integration; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SiGe Technology and Device Meeting, 2006. ISTDM 2006. Third International
Conference_Location :
Princeton, NJ
Print_ISBN :
1-4244-0461-4
Type :
conf
DOI :
10.1109/ISTDM.2006.246540
Filename :
1716034
Link To Document :
بازگشت