DocumentCode :
2765268
Title :
On the Scaling of Emitter Stripes of SiGe Power HBTs
Author :
Guogong Wang ; Hao-Chih Yuan ; Zhenqiang Ma
Author_Institution :
Wisconsin-Madison Univ., Madison, WI
fYear :
2006
fDate :
15-17 May 2006
Firstpage :
1
Lastpage :
2
Abstract :
The emitter stripe width scaling issues for power SiGe HBTs are fully investigated in this work. Both theoretical and experimental results show that the fmax of power SiGe HBTs heavily depends on the emitter stripe width. Different from high speed device design principle, downscale of emitter stripe width is not always valid to improve the performance of power devices due to the presence of significant interconnect resistance. Instead, an optimal emitter stripe width exists, which is decided by both base sheet resistance and total emitter area. Employing a high base doping concentration and with "optimal" emitter stripe width design, the state-of-the-art power SiGe HBTs were successfully developed
Keywords :
Ge-Si alloys; doping profiles; heterojunction bipolar transistors; interconnections; power bipolar transistors; SiGe; base sheet resistance; high base doping concentration; interconnect resistance; optimal emitter stripe; power HBT device; total emitter area; width scaling; Cutoff frequency; Design optimization; Fingers; Germanium silicon alloys; Heterojunction bipolar transistors; Niobium; Power engineering and energy; Radio frequency; Resistors; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SiGe Technology and Device Meeting, 2006. ISTDM 2006. Third International
Conference_Location :
Princeton, NJ
Print_ISBN :
1-4244-0461-4
Type :
conf
DOI :
10.1109/ISTDM.2006.246550
Filename :
1716044
Link To Document :
بازگشت