DocumentCode :
2765325
Title :
Strain Control and Electrical Properties of Stripe Patterned Si/Si1-xGex/Si
Author :
Jangwoong Uhm ; Sakuraba, Masao ; Murota, Junichi
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai
fYear :
2006
fDate :
15-17 May 2006
Firstpage :
1
Lastpage :
2
Abstract :
In the present work, we investigated the behavior of strain and resistivity by submicron-width stripe patterning of Si/Si0.6Ge0.4/Si(100) heterostructure
Keywords :
Ge-Si alloys; electrical resistivity; elemental semiconductors; internal stresses; silicon; strain control; Si-Si0.6Ge0.4-Si; electrical properties; strain control; stripe patterned heterostructures; submicron-width stripe patterning; Capacitive sensors; Charge carrier processes; Conductivity; Electrical resistance measurement; Electron mobility; Laboratories; Plasma measurements; Scanning electron microscopy; Strain control; Strain measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SiGe Technology and Device Meeting, 2006. ISTDM 2006. Third International
Conference_Location :
Princeton, NJ
Print_ISBN :
1-4244-0461-4
Type :
conf
DOI :
10.1109/ISTDM.2006.246554
Filename :
1716048
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2765325
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