Title :
Curved SU-8 structure fabrication based on the acid-diffusion effect
Author :
Chen, Qiang ; Li, Gang ; Zhao, Jianlong
Author_Institution :
State Key Lab. of Transducer Technol., Chinese Acad. of Sci., Shanghai, China
Abstract :
This paper proposes a novel technology to fabricate 3D curved structures on SU-8 resist by a photo-acid-diffusion process. This technology deliberately modifies the standard SU-8 photolithography procedure and allows the diffusion of photo-acid released from UV-exposed regions into the adjacent unexposed resist regions, which would result in forming smooth 3D curved structures after cross-linking and development. The formation mechanism of curved SU-8 structure is demonstrated by experiments and numerical simulation.
Keywords :
micromechanical devices; numerical analysis; photolithography; 3D curved SU-8 structure fabrication; SU-8 photolithography procedure; UV-exposed region; acid-diffusion effect; cross-linking; numerical simulation; photo-acid; photo-acid-diffusion process; Fabrication; Films; Lithography; Mathematical model; Resists; Solvents; Three dimensional displays;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
Conference_Location :
Cancun
Print_ISBN :
978-1-4244-9632-7
DOI :
10.1109/MEMSYS.2011.5734402
