High Frequencies Characterization of High-K Insulators and their Impact on Architectures of MIM Capacitors in Advanced Integrated Circuits

Author

Lacrevaz, T. ; Vo, T.T. ; Piquet, J. ; Bermond, C. ; Fléchet, B. ; Defay, E. ; Thomas, M. ; Farcy, A. ; Cueto, O. ; Torres, J.

Author_Institution

LAHC Univ. de Savoie, Le Bourget du Lac

fYear

2006

fDate

6-8 Dec. 2006

Firstpage

41

Lastpage

44

Abstract

High frequency characterizations of high-K dielectrics and advanced metal-insulator-metal (MIM) capacitors are presented. This work deals with the impact of process on materials permittivity and the effect of architectures and high-K materials on MIM capacitors electrical performances.

Keywords

MIM devices; capacitors; integrated circuits; permittivity; high frequencies characterization; high-K insulators; integrated circuit; materials permittivity; metal-insulator-metal capacitor; Copper; Cutoff frequency; Electromagnetic analysis; Electromagnetic waveguides; High K dielectric materials; High-K gate dielectrics; Insulation; MIM capacitors; Metal-insulator structures; Permittivity measurement; High-K materials, complex permittivty; MIM capacitors; architectures; electrical performances; high frequencies characterization; processes; quality factor, cut-off frequency;

fLanguage

English

Publisher

ieee

Conference_Titel

Optoelectronic and Microelectronic Materials and Devices, 2006 Conference on

Conference_Location

Perth, WA

Print_ISBN

978-1-4244-0578-7

Electronic_ISBN

978-1-4244-0578-7

Type

conf

DOI

10.1109/COMMAD.2006.4429874

Filename

4429874