DocumentCode
2766840
Title
Sacrificial microchannel sealing by glass-frit reflow for Chip Scale Atomic Magnetometer
Author
Tsujimoto, K. ; Hirai, Y. ; Sugano, K. ; Tsuchiya, T. ; Tabata, O.
Author_Institution
Dept. of Micro Eng., Kyoto Univ., Kyoto, Japan
fYear
2011
fDate
23-27 Jan. 2011
Firstpage
368
Lastpage
371
Abstract
This paper reports on a novel and simple packaging technique to enhance the atmosphere controllability of the microfabricated alkali vapor cell used for CSAMs (Chip Scale Atomic Magnetometers), in which sacrificial microchannels at the bonded interface are utilized as gas feedthrough for evacuation and filling, subsequently sealed by glass-frit reflow. By applying the proposed method, a 10 mm3 potassium vapor cell with 0.1 MPa helium buffer gas was fabricated. Sealing of the microchannels by glass-frit reflow were successfully demonstrated adopting the optimized parameters as 460-480°C at bonding pressure of more than 250 kPa. The leak rate of less than 3.1×10-14 Pa·m3/s, which is required sealing quality for CSAM, was verified through a high resolution helium leak test.
Keywords
magnetometers; microchannel flow; microfabrication; reflow soldering; seals (stoppers); atmosphere controllability; chip scale atomic magnetometer; glass-frit reflow; microfabricated alkali vapor cell; packaging technique; sacrificial microchannel sealing; temperature 460 degC to 480 degC; Atomic clocks; Filling; Glass; Helium; Microchannel; Micromechanical devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
Conference_Location
Cancun
ISSN
1084-6999
Print_ISBN
978-1-4244-9632-7
Type
conf
DOI
10.1109/MEMSYS.2011.5734438
Filename
5734438
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