DocumentCode
2766910
Title
Optical and structural properties of InAs quantum dots emitting near 1.5 μm grown on a GaAs substrate with an InxGa1-xAS metamorphic buffer layer
Author
Tavakoli, S.G. ; Hulkot, Oksana ; Thompson, David A.
Author_Institution
McMaster Univ., Hamilton
fYear
2006
fDate
6-8 Dec. 2006
Firstpage
176
Lastpage
179
Abstract
The structural and optical properties of InAs quantum dots (QDs) grown on an InxGa1-xAS metamorphic layer, with different x values, on GaAs substrates are presented. The results for various QD layer thicknesses and growth temperatures are reported. The density of the dots and their diameter increase as the In content in the metamorphic layer increases. For a layer of dots grown in a strained InGaAs quantum well, incorporated in a metamorphic layer with 30% In, room temperature photoluminescence emission at 1.57 μm has been demonstrated.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; semiconductor growth; semiconductor quantum dots; semiconductor quantum wells; InGaAs; metamorphic buffer layer; optical properties; quantum dots; size 1.5 μm; strained quantum well; structural properties; Atomic force microscopy; Buffer layers; Gallium arsenide; Photoluminescence; Quantum dot lasers; Quantum dots; Quantum well lasers; Stimulated emission; Substrates; Temperature; Epitaxy; metamorphic strucutre; quantum dots;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials and Devices, 2006 Conference on
Conference_Location
Perth, WA
Print_ISBN
978-1-4244-0577-0
Electronic_ISBN
978-1-4244-0578-7
Type
conf
DOI
10.1109/COMMAD.2006.4429909
Filename
4429909
Link To Document