• DocumentCode
    2767104
  • Title

    Advanced processing methods for As2S3 Waveguide Fabrication

  • Author

    Duk Yong Choi ; Madden, Steve ; Rode, Andrei ; Wang, Rongping ; Luther-Davies, Barry

  • Author_Institution
    Australian Nat. Univ., Canberra
  • fYear
    2006
  • fDate
    6-8 Dec. 2006
  • Firstpage
    232
  • Lastpage
    235
  • Abstract
    We have developed a fabrication process of As2S3 waveguides. The main issues were to find suitable protective layer of As2S3 film from alkaline developer attack and plasma etch chemistry. These developments enable quasi vertical-profiled and small dimension loss waveguides processed with standard photolithographic and plasma etching process.
  • Keywords
    arsenic compounds; photolithography; sputter etching; waveguides; As2S3; alkaline developer attack; photolithographic process; plasma etch chemistry; small dimension loss waveguide; ultrafast pulsed laser deposition; waveguide fabrication; Etching; Optical device fabrication; Optical films; Optical waveguides; Plasma applications; Plasma chemistry; Plasma waves; Protection; Pulsed laser deposition; Waveguide lasers; Ge33As12Se55 protective layer; arsenic tri-sulphide; plasma etching; ultra-fast pulsed laser deposition;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials and Devices, 2006 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    978-1-4244-0578-7
  • Electronic_ISBN
    978-1-4244-0578-7
  • Type

    conf

  • DOI
    10.1109/COMMAD.2006.4429923
  • Filename
    4429923
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2767104