Title :
Advanced processing methods for As2S3 Waveguide Fabrication
Author :
Duk Yong Choi ; Madden, Steve ; Rode, Andrei ; Wang, Rongping ; Luther-Davies, Barry
Author_Institution :
Australian Nat. Univ., Canberra
Abstract :
We have developed a fabrication process of As2S3 waveguides. The main issues were to find suitable protective layer of As2S3 film from alkaline developer attack and plasma etch chemistry. These developments enable quasi vertical-profiled and small dimension loss waveguides processed with standard photolithographic and plasma etching process.
Keywords :
arsenic compounds; photolithography; sputter etching; waveguides; As2S3; alkaline developer attack; photolithographic process; plasma etch chemistry; small dimension loss waveguide; ultrafast pulsed laser deposition; waveguide fabrication; Etching; Optical device fabrication; Optical films; Optical waveguides; Plasma applications; Plasma chemistry; Plasma waves; Protection; Pulsed laser deposition; Waveguide lasers; Ge33As12Se55 protective layer; arsenic tri-sulphide; plasma etching; ultra-fast pulsed laser deposition;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2006 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
978-1-4244-0578-7
Electronic_ISBN :
978-1-4244-0578-7
DOI :
10.1109/COMMAD.2006.4429923
