DocumentCode :
2768486
Title :
Fabrication and characterization of 3D integrated 2 DOF Micromirror Arrays for excessive thermal loads
Author :
Ataman, Ç ; Lani, S. ; Noell, W. ; Jutzi, F. ; Bayat, D. ; de Rooij, N.
Author_Institution :
Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland
fYear :
2011
fDate :
23-27 Jan. 2011
Firstpage :
684
Lastpage :
687
Abstract :
This paper reports a high fill-factor (>;90%), 2-dimensional analog micromirror array designed specifically for very high, optically induced thermal load applications. Each pixel can attain a mechanical DC rotation angle of ±4 degrees around any arbitrary axis with 170V excitation. The maximum temperature rise on the mirror surface with 7 KW/m2 thermal load under 1 Pa ambient pressure is below 230°C. A detailed assessment of the fabrication process - including the poly-Si vertical electrodes, wafer level mirror bonding, and copper electroplating of structural layers-, and characterization methodology is presented with experimental results.
Keywords :
bonding processes; electroplating; microfabrication; micromirrors; silicon; 2D analog micromirror array; 3D integrated 2 DOF micromirror array; Si; copper electroplating; fabrication process; optically induced thermal load application; poly-silicon vertical electrode; voltage 170 V; wafer level mirror bonding; Actuators; Electrodes; Micromirrors; Silicon; Springs; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
Conference_Location :
Cancun
ISSN :
1084-6999
Print_ISBN :
978-1-4244-9632-7
Type :
conf
DOI :
10.1109/MEMSYS.2011.5734517
Filename :
5734517
Link To Document :
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