• DocumentCode
    2769616
  • Title

    Design space exploration for robust power delivery in TSV based 3-D systems-on-chip

  • Author

    Satheesh, Suhas M. ; Salman, Emre

  • Author_Institution
    High-Speed Fabrics Team, NVIDIA, Santa Clara, CA, USA
  • fYear
    2012
  • fDate
    12-14 Sept. 2012
  • Firstpage
    307
  • Lastpage
    311
  • Abstract
    3-D integration technologies offer significant advantages to develop multiprocessor systems-on-chip with embedded memory. Reliable power distribution is a challenging issue in these systems due to multiple planes and through silicon vias (TSVs). The two primary TSV technologies, via-first and vialast, have been evaluated for power delivery in a 32 nm 3D system with eight memory planes and one processor plane. Since the impedance characteristics of via-first and via-last based TSVs are significantly different due to distinct filling materials and dimensions, the power distribution network in each case exhibits different design requirements. A valid design space is identified for both cases. Despite the low parasitic resistance of a via-last TSV, a power network based on via-last TSVs produces signal routing blockages. Furthermore, via-last TSVs exhibit high inductive behavior, producing a non-monotonic design space. It is demonstrated that via-first TSVs can satisfy the power supply noise at the expense of 7.5% additional area as compared to via-last TSVs.
  • Keywords
    integrated circuit design; multiprocessing systems; system-on-chip; three-dimensional integrated circuits; 3D integration technology; 3D system; 3D system-on-chip; design space exploration; impedance characteristics; low parasitic resistance; multiprocessor systems-on-chip; nonmonotonic design space; power distribution network; power network; power supply noise; processor plane; robust power delivery; signal routing blockages; size 32 nm; through silicon vias; via-first TSV; via-last TSV; Capacitance; Integrated circuit modeling; Metals; Noise; Power supplies; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOC Conference (SOCC), 2012 IEEE International
  • Conference_Location
    Niagara Falls, NY
  • ISSN
    2164-1676
  • Print_ISBN
    978-1-4673-1294-3
  • Type

    conf

  • DOI
    10.1109/SOCC.2012.6398327
  • Filename
    6398327