Title :
On-chip self-calibrated process-temperature sensor for TSV 3D integration
Author :
Chiang, Tzu-Ting ; Huang, Po-Tsang ; Chuang, Ching-Te ; Chen, Kuan-Neng ; Chiou, Jin-Chern ; Chen, Kuo-Hua ; Chiu, Chi-Tsung ; Tong, Ho-Ming ; Hwang, Wei
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
In TSV 3D integration, stacking multiple dies would face a severe challenge of the thermal stress and Vt scatter. In this paper, a fully on-chip self-calibrated process-temperature (PT) sensor is proposed to monitor the transistor variations (Vtn, Vtp) and temperature of the intra-die for 3D-ICs. The process information and temperature can be decoupled using the process-sensitive and temperature-dependent ring oscillators. Based on TSMC 65nm CMOS process, this sensor achieves 367.5 pJ per conversion, and the sensitivities of Vtn, Vtp and the inaccuracy of temperature are merely ±1.6mV, ±0.8mV, and ±1.5oC, respectively.
Keywords :
CMOS analogue integrated circuits; calibration; oscillators; temperature sensors; three-dimensional integrated circuits; TSMC CMOS process; TSV 3D integration; fully on-chip self-calibrated process-temperature sensor; intradie temperature; process-sensitive ring oscillators; size 65 nm; temperature-dependent ring oscillators; thermal stress; Delay; Logic gates; Radiation detectors; Ring oscillators; Temperature sensors; Threshold voltage; Through-silicon vias;
Conference_Titel :
SOC Conference (SOCC), 2012 IEEE International
Conference_Location :
Niagara Falls, NY
Print_ISBN :
978-1-4673-1294-3
DOI :
10.1109/SOCC.2012.6398338