DocumentCode :
2770675
Title :
Architecture approaching the atomic scale
Author :
DeHon, André
Author_Institution :
Univ. of Pennsylvania, Philadelphia
fYear :
2007
fDate :
11-13 Sept. 2007
Firstpage :
11
Lastpage :
20
Abstract :
Both bottom-up and top-down techniques have been used to fabricate assemblies of devices and interconnect where key, density-defining feature sizes are on the order of ten atoms wide. We show how complete computing architectures can be constructed from these new techniques and building blocks despite high defect rates, extreme regularity requirements, and statistical assembly. We further highlight the paradigm shifts in integrated circuit design and architecture which appear necessary to accommodate these atomic-scale effects. Our estimates suggest a 10 nm full-pitch FPGA-like design can achieve one to two orders of magnitude greater logic density than ideal, defect-free lithographic scaling to 22 nm.
Keywords :
atomic structure; integrated circuit design; statistical analysis; FPGA-like design; architecture approaching; atomic scale; integrated circuit architecture; integrated circuit design; statistical assembly; Assembly; Atomic layer deposition; Atomic measurements; Computer architecture; Conducting materials; Dielectrics and electrical insulation; Nanowires; Semiconductivity; Semiconductor materials; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Circuits Conference, 2007. ESSCIRC 2007. 33rd European
Conference_Location :
Munich
ISSN :
1930-8833
Print_ISBN :
978-1-4244-1125-2
Type :
conf
DOI :
10.1109/ESSCIRC.2007.4430241
Filename :
4430241
Link To Document :
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