DocumentCode :
2771364
Title :
Ultralow-voltage RAM technology - current status and future trends
Author :
Itoh, Kiyoo
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
fYear :
2003
fDate :
16-18 Dec. 2003
Firstpage :
3
Lastpage :
8
Abstract :
This paper reviews leakage current reduction circuits for ultralow-voltage DRAMs and SRAMs. First, it discusses general features of leakage currents (especially, gate tunnel current and subthreshold current), their detrimental effects on RAMs, and the current status of leakage-current reduction. Second, it summarizes useful concepts to reduce subthreshold currents that can even be applied to the active mode. Third, the advantages of RAMs over random logic gates with respect to reducing subthreshold currents are clarified, and the above concepts are applied to RAM cells and peripheral circuits to reduce standby as well as active current. Finally, a perspective is given with emphasis on needs for new devices and circuits to reduce active-mode leakage currents, and for high-speed simple non-volatile RAMs.
Keywords :
DRAM chips; SRAM chips; leakage currents; low-power electronics; RAM cell; active-mode leakage current; gate tunnel current; high-speed simple nonvolatile RAM; leakage current reduction circuit; peripheral circuits; random logic gate; subthreshold current; ultralow-voltage DRAM; ultralow-voltage RAM technology; ultralow-voltage SRAM; Capacitors; Leakage current; Logic circuits; Logic devices; Logic gates; Nonvolatile memory; Random access memory; Read-write memory; Subthreshold current; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2003 IEEE Conference on
Print_ISBN :
0-7803-7749-4
Type :
conf
DOI :
10.1109/EDSSC.2003.1283471
Filename :
1283471
Link To Document :
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