DocumentCode :
2772168
Title :
A novel experimental method to measure interface trap density in gate-drain overlap region
Author :
Liu, Dongming ; Wang, Jmyan ; Yang, Guoyong ; Xu, Mingzhen ; Tan, Changhua
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2003
fDate :
16-18 Dec. 2003
Firstpage :
205
Lastpage :
208
Abstract :
In this paper, a novel trap induced drain leakage (TIDL) current measurement method to quantificationally measure the interface trap density in the gate-drain overlap region was proposed. By measuring the trap induced leakage (TIDL) current and using the formulas developed in this work, the generated interface trap density in the gate-drain overlap region during the hot carrier stress can be calculated instantly. It is found that the stress-time dependence of interface trap generation follow a power law.
Keywords :
MOSFET; electric current measurement; electron field emission; hot carriers; interface states; leakage currents; current measurement; gate-drain overlap region; hot carrier stress; interface trap density; power law; stress-time dependence; trap induced drain leakage current; Capacitance measurement; Charge carrier processes; Charge measurement; Charge pumps; Current measurement; Density measurement; Stress measurement; Thermal stresses; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2003 IEEE Conference on
Print_ISBN :
0-7803-7749-4
Type :
conf
DOI :
10.1109/EDSSC.2003.1283515
Filename :
1283515
Link To Document :
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