DocumentCode :
2773887
Title :
Methodology for automated layout migration for 90nm Itanium®2 processor design
Author :
Lin, Kuang-Kuo ; Kale, Sudhakar ; Nigam, Aditi
Author_Institution :
Intel Corp., USA
fYear :
2004
fDate :
2004
Firstpage :
31
Lastpage :
35
Abstract :
Unlike past semiconductor manufacturing processes, nanometer technology has seen an exponential growth of complex design rules and constraints. As a result, direct optical shrink of products between process nodes is becoming less feasible. To facilitate aggressive time-to-market requirements by re-using designs under new process technology, new CAD automation tools and methodologies have been developed. This paper describes a process shifting flow of 130nm custom layout to 90nm. Design challenges at the new process will first be overviewed, followed by EDA-assisted layout migration. Finally, productivity gains together with the design qualities will be shown on the implementation of a next generation Itanium@2 server chip.
Keywords :
application specific integrated circuits; circuit layout CAD; integrated circuit layout; microprocessor chips; nanoelectronics; productivity; 90 nm; CAD automation tools; EDA-assisted layout migration; Itanium≫2 processor design; automated layout migration; custom layout; design rules; nanometer technology; process shifting flow; productivity gain; Design automation; Electronics industry; Job shop scheduling; Logic devices; Manufacturing automation; Manufacturing processes; Optical design; Process design; Productivity; Routing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design, 2004. Proceedings. 5th International Symposium on
Print_ISBN :
0-7695-2093-6
Type :
conf
DOI :
10.1109/ISQED.2004.1283646
Filename :
1283646
Link To Document :
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