• DocumentCode
    2777701
  • Title

    Determination of the Interfacial Fracture Toughness of Laminated Silicon Die on Adhesive Dicing Tape from Stud Pull Measurement

  • Author

    Cheung, Y.M. ; Chong, Arthur C M ; Huang, B.

  • Author_Institution
    ASM Assembly Autom. Ltd., Kowloon
  • fYear
    2006
  • fDate
    11-14 Dec. 2006
  • Firstpage
    1
  • Lastpage
    10
  • Abstract
    Stud pull measurements have been conducted to obtain the normal forces required to detach die attach film (DAF) laminated dice from UV dicing tapes. The DAF is commonly used as bonding media for thin die attach process. Peak normal forces required to pull the laminated dice apart are obtained from the measurement for various DAFs and adhesive dicing tapes at different temperatures. We construct a FEM model by using ABAQUS for given configuration. The applied J-integrals are calculated under the same loading conditions as in experimental set up. The result of the FEM analysis helps us to interpret the force signal obtained in stud pull measurement. Scaling rules are developed from the numerical results of the FEM model to determine the applied J-integral for any die size by using a reference curve. We use these scaling rules and the peak normal force obtained from stud pull measurement to estimate the critical applied J- integral and the fracture toughness of the interface between DAF laminated dice and adhesive dicing tapes for given samples.
  • Keywords
    adhesion; elemental semiconductors; field emission electron microscopy; fracture toughness; laminates; microassembling; silicon; FEM model; Si; critical applied J- integral; die attach film; interfacial fracture toughness; laminated silicon die; stud pull measurement; Adhesives; Bonding forces; Bonding processes; Force measurement; Microassembly; Pollution measurement; Silicon; Temperature; Throughput; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2006. EMAP 2006. International Conference on
  • Conference_Location
    Kowloon
  • Print_ISBN
    978-1-4244-0834-4
  • Electronic_ISBN
    978-1-4244-0834-4
  • Type

    conf

  • DOI
    10.1109/EMAP.2006.4430638
  • Filename
    4430638