Photoelectrode materials of tungsten oxide (WO/sub 3/) for water splitting

Author

Enesca, Alexandru ; Duta, Anca ; Nanu, Marius ; Enache, Cristina ; van der Krol, Roel ; Schoonman, Joop

Author_Institution

Centre for Integrated Product Design for Sustainability, Transilvania Univ. of Brasov

Volume

2

fYear

2005

fDate

5-5 Oct. 2005

Firstpage

293

Abstract

The aim of this paper is to investigate the stability of the tungsten trioxide thin films in different conditions. Tungsten oxide (WO ₃) films are prepared by means of the spray pyrolysis deposition (SPD) method using W(OC₂H₅)₂ ethanol. The films were investigated from the morphologic (SEM), crystalline (XRD) and conductive point of view. The resulting films are conductive, crystalline and with a good conductivity in acid electrolyte. The photoelectrolysis seems to be the most efficient and non-polluting method that can be used for wafer splitting using like energy the sunlight radiation

Keywords

X-ray diffraction; electrical conductivity; electrochemical electrodes; electrolysis; photoelectrochemistry; pyrolysis; scanning electron microscopy; spray coatings; thin films; tungsten compounds; SEM; WO₃; XRD; acid electrolyte; conductivity; ethanol; nonpolluting method; photoelectrode materials; photoelectrolysis; spray pyrolysis deposition; sunlight radiation; tungsten trioxide thin films; wafer splitting; water splitting; Cathodes; Ethanol; Hydrogen; Production; Semiconductor films; Spraying; Stability; Tungsten; Water pollution; X-ray scattering;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International

Conference_Location

Sinaia

Print_ISBN

0-7803-9214-0

Type

conf

DOI

10.1109/SMICND.2005.1558782

Filename

1558782