DocumentCode :
2779352
Title :
Influence of gate engineering on the analog and RF performance of DG MOSFETs
Author :
Mohankumar, N. ; Syamal, Binit ; Sarkar, C.K. ; Ravi, S.
Author_Institution :
Dept of Electron.&Telecommun. Eng., Jadavpur Univ., Kolkata
fYear :
2008
fDate :
18-20 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
The design of analog and radio-frequency (RF) circuits in CMOS technology has become increasingly more difficult as device modeling faces new challenges in the deep sub micrometer regime and emerging circuit applications. Double gate MOSFETs show greater promise in this regard with improved short channel effects, high gate control and reduced leakage. But still they may be engineered for better performances in case of analog design. In this paper, we explore the influence of gate engineering on the analog and RF performances of Double gate MOSFETs for mixed signal applications.
Keywords :
CMOS analogue integrated circuits; MOSFET; integrated circuit design; radiofrequency integrated circuits; double gate MOSFET; emerging circuit applications; gate engineering; mixed signal applications; radio-frequency circuits; CMOS analog integrated circuits; CMOS technology; Consumer electronics; Cutoff frequency; Design engineering; Integrated circuit technology; MOSFETs; Radio frequency; Threshold voltage; Transconductance; Drain Induced Barrier Applications (DIBL); Dual Material Gate (DMG); Mixed Signal Applications; Short Channel Effects (SCEs); Single Material Gate (SMG);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computing, Communication and Networking, 2008. ICCCn 2008. International Conference on
Conference_Location :
St. Thomas, VI
Print_ISBN :
978-1-4244-3594-4
Electronic_ISBN :
978-1-4244-3595-1
Type :
conf
DOI :
10.1109/ICCCNET.2008.4787745
Filename :
4787745
Link To Document :
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