DocumentCode
2779352
Title
Influence of gate engineering on the analog and RF performance of DG MOSFETs
Author
Mohankumar, N. ; Syamal, Binit ; Sarkar, C.K. ; Ravi, S.
Author_Institution
Dept of Electron.&Telecommun. Eng., Jadavpur Univ., Kolkata
fYear
2008
fDate
18-20 Dec. 2008
Firstpage
1
Lastpage
4
Abstract
The design of analog and radio-frequency (RF) circuits in CMOS technology has become increasingly more difficult as device modeling faces new challenges in the deep sub micrometer regime and emerging circuit applications. Double gate MOSFETs show greater promise in this regard with improved short channel effects, high gate control and reduced leakage. But still they may be engineered for better performances in case of analog design. In this paper, we explore the influence of gate engineering on the analog and RF performances of Double gate MOSFETs for mixed signal applications.
Keywords
CMOS analogue integrated circuits; MOSFET; integrated circuit design; radiofrequency integrated circuits; double gate MOSFET; emerging circuit applications; gate engineering; mixed signal applications; radio-frequency circuits; CMOS analog integrated circuits; CMOS technology; Consumer electronics; Cutoff frequency; Design engineering; Integrated circuit technology; MOSFETs; Radio frequency; Threshold voltage; Transconductance; Drain Induced Barrier Applications (DIBL); Dual Material Gate (DMG); Mixed Signal Applications; Short Channel Effects (SCEs); Single Material Gate (SMG);
fLanguage
English
Publisher
ieee
Conference_Titel
Computing, Communication and Networking, 2008. ICCCn 2008. International Conference on
Conference_Location
St. Thomas, VI
Print_ISBN
978-1-4244-3594-4
Electronic_ISBN
978-1-4244-3595-1
Type
conf
DOI
10.1109/ICCCNET.2008.4787745
Filename
4787745
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