• DocumentCode
    2779352
  • Title

    Influence of gate engineering on the analog and RF performance of DG MOSFETs

  • Author

    Mohankumar, N. ; Syamal, Binit ; Sarkar, C.K. ; Ravi, S.

  • Author_Institution
    Dept of Electron.&Telecommun. Eng., Jadavpur Univ., Kolkata
  • fYear
    2008
  • fDate
    18-20 Dec. 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The design of analog and radio-frequency (RF) circuits in CMOS technology has become increasingly more difficult as device modeling faces new challenges in the deep sub micrometer regime and emerging circuit applications. Double gate MOSFETs show greater promise in this regard with improved short channel effects, high gate control and reduced leakage. But still they may be engineered for better performances in case of analog design. In this paper, we explore the influence of gate engineering on the analog and RF performances of Double gate MOSFETs for mixed signal applications.
  • Keywords
    CMOS analogue integrated circuits; MOSFET; integrated circuit design; radiofrequency integrated circuits; double gate MOSFET; emerging circuit applications; gate engineering; mixed signal applications; radio-frequency circuits; CMOS analog integrated circuits; CMOS technology; Consumer electronics; Cutoff frequency; Design engineering; Integrated circuit technology; MOSFETs; Radio frequency; Threshold voltage; Transconductance; Drain Induced Barrier Applications (DIBL); Dual Material Gate (DMG); Mixed Signal Applications; Short Channel Effects (SCEs); Single Material Gate (SMG);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computing, Communication and Networking, 2008. ICCCn 2008. International Conference on
  • Conference_Location
    St. Thomas, VI
  • Print_ISBN
    978-1-4244-3594-4
  • Electronic_ISBN
    978-1-4244-3595-1
  • Type

    conf

  • DOI
    10.1109/ICCCNET.2008.4787745
  • Filename
    4787745