Title :
Advanced PECVD technology for manufacturing AM LCDs
Author :
Tsai, Chuang-Chuang ; Shang, Quanyuan ; Takehara, Takako ; Harshbarger, William ; Law, Kam
Author_Institution :
Appl. Komatsu Technol., Santa Clara, CA, USA
Abstract :
PECVD is one of the most critical technologies for manufacturing AM LCD devices. Advanced PECVD systems have been developed for low temperature deposition of a-Si, SiNx, SiO2, SiON, and n-Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrate processing and flexible process flows. Recent reports indicate that good polysilicon TFTs have been manufactured using laser crystallization of a-Si precursor films. This paper reviews the development of PECVD systems for volume manufacturing of LCDs and discusses process technology and requirements for future manufacturing
Keywords :
amorphous semiconductors; crystallisation; elemental semiconductors; laser materials processing; liquid crystal displays; plasma CVD; reviews; semiconductor growth; silicon; silicon compounds; thin film transistors; AM LCDs; PECVD technology; Si; SiN; SiNx; SiO2; SiON; a-Si; a-Si precursor films; cluster tool configurations; flexible process flows; laser crystallization; low temperature deposition; n-Si films; polysilicon TFTs; process control; review; single substrate processing; volume manufacturing; Chemical technology; Flexible manufacturing systems; Liquid crystal displays; Manufacturing processes; Plasma displays; Plasma temperature; Process control; Productivity; Pulp manufacturing; Telephony;
Conference_Titel :
Information Display, 1999. ASID '99. Proceedings of the 5th Asian Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
957-97347-9-8
DOI :
10.1109/ASID.1999.762760
