DocumentCode
2779765
Title
Pigment-dispersed color resist with high resolution for advanced color filter application
Author
Jer, Lee Rong ; Jr-Cheng Fan ; Shing, Cheng Tzong ; Lung, Wu Jung
Author_Institution
Mater. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
fYear
1999
fDate
1999
Firstpage
359
Lastpage
363
Abstract
A positive working pigment-dispersed color resist comprising organic pigments and a chemically amplified resist system is designed for a high resolution color filter with fine patterns of less than 5 μm lines and spaces. It also shows high brightness and good color reproducibility. An acrylic binder including an acid labile group and an aromatic function group that have both functions of acid catalysed unblocking and good compatibility with pigments is also synthesized
Keywords
brightness; optical filters; photoresists; acid catalysed unblocking; acid labile group; acrylic binder; aromatic function group; brightness; chemically amplified resist; color filter; color reproducibility; pigment-dispersed color resist; positive working PDCR; Brightness; Filters; Lungs; Organic chemicals; Pigmentation; Pigments; Reproducibility of results; Resins; Resists; Thermal force;
fLanguage
English
Publisher
ieee
Conference_Titel
Information Display, 1999. ASID '99. Proceedings of the 5th Asian Symposium on
Conference_Location
Hsinchu
Print_ISBN
957-97347-9-8
Type
conf
DOI
10.1109/ASID.1999.762781
Filename
762781
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