Title :
Pigment-dispersed color resist with high resolution for advanced color filter application
Author :
Jer, Lee Rong ; Jr-Cheng Fan ; Shing, Cheng Tzong ; Lung, Wu Jung
Author_Institution :
Mater. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
Abstract :
A positive working pigment-dispersed color resist comprising organic pigments and a chemically amplified resist system is designed for a high resolution color filter with fine patterns of less than 5 μm lines and spaces. It also shows high brightness and good color reproducibility. An acrylic binder including an acid labile group and an aromatic function group that have both functions of acid catalysed unblocking and good compatibility with pigments is also synthesized
Keywords :
brightness; optical filters; photoresists; acid catalysed unblocking; acid labile group; acrylic binder; aromatic function group; brightness; chemically amplified resist; color filter; color reproducibility; pigment-dispersed color resist; positive working PDCR; Brightness; Filters; Lungs; Organic chemicals; Pigmentation; Pigments; Reproducibility of results; Resins; Resists; Thermal force;
Conference_Titel :
Information Display, 1999. ASID '99. Proceedings of the 5th Asian Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
957-97347-9-8
DOI :
10.1109/ASID.1999.762781
