• DocumentCode
    2779968
  • Title

    The scalability of 8T-SRAM cells under the influence of intrinsic parameter fluctuations

  • Author

    Cheng, B. ; Roy, S. ; Asenov, A.

  • Author_Institution
    Univ. of Glasgow Glasgow, Glasgow
  • fYear
    2007
  • fDate
    11-13 Sept. 2007
  • Firstpage
    93
  • Lastpage
    96
  • Abstract
    Intrinsic parameter fluctuations are already a limiting factor for 6-Transistor SRAM scaling. In order to maintain the benefits of CMOS scaling, new SRAM cell designs are necessary. An 8-Transistor SRAM cell structure is investigated and the impact of random doping fluctuations on its read and write noise margins, considering various supply voltages, are discussed. The results demonstrate impressive scalability, and indicate that the scaling window is still open for SRAM in the deca-nanometer regime.
  • Keywords
    CMOS memory circuits; SRAM chips; semiconductor doping; 6-transistor SRAM scaling; 8-Transistor SRAM cell structure; 8T-SRAM cells; CMOS scaling; SRAM cell design; intrinsic parameter fluctuations; limiting factor; random doping fluctuation; Degradation; Fluctuations; MOSFETs; Microprocessors; Random access memory; Resource description framework; Scalability; Stability; Strontium; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
  • Conference_Location
    Munich
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4244-1123-8
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2007.4430887
  • Filename
    4430887