Title :
Analog design challenges and trade-offs using emerging materials and devices
Author :
Fulde, M. ; Mercha, A. ; Gustin, C. ; Parvais, B. ; Subramanian, V. ; Arnim, K.V. ; Bauer, F. ; Schruefer, K. ; Schmitt-Landsiedel, D. ; Knoblinger, G.
Author_Institution :
Tech. Univ., Munich
Abstract :
Analog device figures-of-merit change significantly with the introduction of advanced materials and devices such as high-k or multiple-gate FETs. Measurements show enhanced intrinsic gain and matching behavior for MuGFETs which help to reduce area and power consumption in analog circuits. However, high-k degrades matching, flicker noise and Vt stability. Measured device performance is used to simulate the impact of these trends on circuit design trade-offs. Migrating from SiON to HfO2 dielectric approximately doubles area and power consumption to keep matching and noise performance constant. Transient VT instabilities in the range of 10 mV can degrade the resolution of analog-to-digital converters by more than one bit. The use of non-binary ADCs is proposed to overcome these issues.
Keywords :
analogue integrated circuits; analogue-digital conversion; field effect transistors; hafnium compounds; integrated circuit design; low-power electronics; silicon compounds; HfO2; SiON; analog circuits; analog design; analog device figures-of-merit; circuit design; multiple-gate FET; nonbinary analog-to-digital converters; power consumption; 1f noise; Analog circuits; Area measurement; Degradation; Energy consumption; FETs; Gain measurement; High K dielectric materials; High-K gate dielectrics; Power measurement;
Conference_Titel :
Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
Conference_Location :
Munich
Print_ISBN :
978-1-4244-1123-8
Electronic_ISBN :
1930-8876
DOI :
10.1109/ESSDERC.2007.4430894