DocumentCode :
2780336
Title :
Microscopic modeling of high frequency noise in SiGe HBTs
Author :
Ramonas, Mindaugas ; Sakalas, Paulius ; Jungemann, Christoph ; Schroter, Michael ; Kraus, Wolfgang ; Shimukovitch, Artur
Author_Institution :
Bundeswehr Univ., Neubiberg
fYear :
2007
fDate :
11-13 Sept. 2007
Firstpage :
183
Lastpage :
186
Abstract :
The SIMS doping profile of SiGe heterojunction bipolar transistor is calibrated for best agreement of the hydrodynamic model results with the experiment. DC and small-signal data is used for the calibration. The terminal current noise calculations are performed using both hydrodynamic and drift-diffusion models with the calibrated doping profile. The calculation results are compared with the experimental values. Overall good agreement for the minimum noise figure, the noise resistance, and the optimum reflection coefficient is obtained. The difference between the hydrodynamic and drift-diffusion model results is analyzed using spectral intensities of the base and collector current fluctuations.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; semiconductor device models; DC signal data; SIMS doping profile; SiGe; calibration; drift-diffusion models; heterojunction bipolar transistor; high frequency noise; hydrodynamic models; microscopic modeling; noise resistance; small-signal data; Calibration; Doping profiles; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Hydrodynamics; Microscopy; Noise figure; Semiconductor process modeling; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
Conference_Location :
Munich
ISSN :
1930-8876
Print_ISBN :
978-1-4244-1123-8
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2007.4430909
Filename :
4430909
Link To Document :
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