DocumentCode
2780758
Title
Mobility issues in double-gate SOI MOSFETs: Characterization and analysis
Author
Rodriguez, N. ; Cristoloveanu, S. ; Nguyen, L. Pham ; Gamiz, F.
Author_Institution
Inst. de Microelectron., Grenoble
fYear
2007
fDate
11-13 Sept. 2007
Firstpage
271
Lastpage
274
Abstract
The carrier mobility in ultra-thin SOI transistors was measured at the front channel, back channel and in double gate mode (DG). A model for generalizing the mobility extraction method, based on the F-function, is proposed. In DG-mode the apparent mobility is the sum of front and back channel mobilities only if the two channels are independent (partially depleted or relatively thick fully depleted MOSFETs). In ultrathin transistors, the coupling effect should be accounted for achieving a balanced DG-mode. An outstanding apparent mobility enhancement in DG-mode is measured which cannot be explained by a 2-channels model. This result gives clear evidence of the benefit of volume inversion.
Keywords
MOSFET; carrier mobility; silicon-on-insulator; carrier mobility; channel mobilities; double-gate SOI MOSFET; mobility extraction method; outstanding apparent mobility enhancement; ultra-thin SOI transistors; volume inversion; Analytical models; Attenuation; Current measurement; Electrical resistance measurement; Insulation; MOSFETs; Physics; Semiconductor films; Threshold voltage; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
Conference_Location
Munich
ISSN
1930-8876
Print_ISBN
978-1-4244-1123-8
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2007.4430930
Filename
4430930
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