Title :
New capacitor parametric test methodology for process issues control
Author :
Manceau, J.-P. ; Bajolet, A. ; Cremer, Sebastien ; Quoirin, M. ; Bruyere, S. ; Sylvestre, A. ; Gonon, P.
Author_Institution :
STMicroelectron., Crolles
Abstract :
This paper describes a new measurement methodology based on LCR-meter tan(delta) measurement versus frequency. Directly integrated during parametric test, it gives information on capacitors key parameters like dielectric relaxation, potential dielectric contamination, extrinsic conduction, series resistance and process issue. The methodology is validated, thanks to the Kramers-Kronig relations, traditional I(V) measurements and series resistance model. Finally a practical example of a 3D MIM capacitor is studied.
Keywords :
capacitors; dielectric relaxation; I V measurement; Kramers-Kronig relation; LCR-meter tan measurement; capacitor parametric test methodology; dielectric relaxation; extrinsic conduction; potential dielectric contamination; series resistance model; Dielectric losses; Dielectric measurements; Electrical resistance measurement; Frequency measurement; Leakage current; MIM capacitors; Pollution measurement; Process control; Radio frequency; Testing;
Conference_Titel :
Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
Conference_Location :
Munich
Print_ISBN :
978-1-4244-1123-8
Electronic_ISBN :
1930-8876
DOI :
10.1109/ESSDERC.2007.4430962
