DocumentCode :
2781296
Title :
Microwave performance of vertical dual carrier field effect transistors and integrated circuits
Author :
Huang, Chao ; Yang, Young Hwi ; Huang, D.H. ; Sun, Y.M. ; Lu, Qianxi
Author_Institution :
China Aerosp. Corp., Beijing, China
fYear :
2000
fDate :
2000
Firstpage :
13
Lastpage :
16
Abstract :
The authors discuss the device physics and microwave performance of the Vertical Dual Carrier Field Effect Transistor (VDCFET) and VDCFET ICs. The Si VDCFET and Si VDCFEIC have the advantages of very short effective channel, i.e. length less than 20 nm. The GaAs VDCFET and GaAs VDCFEIC have the further advantages of higher electron mobility. They can also be fabricated by molecular beam epitaxy or the MOCVD process. This new mode of operation opens up a new wide application field with better performance, including microwave, switching, and even System on a chip (SOC) application for sub-20 nm effective channel length. This is a low voltage family of devices. However, these can also be power devices through parallel connection in a matrix form of many cells to give currents in the range of amperes
Keywords :
equivalent circuits; field effect MMIC; gallium arsenide; microwave field effect transistors; semiconductor device models; silicon; 20 nm; FET integrated circuits; GaAs; MOCVD process; Si; VDC FETs; device physics; electron mobility; field effect transistors; microwave performance; molecular beam epitaxy; parallel device connection; power devices; vertical dual carrier FETs; Charge carrier processes; FET integrated circuits; MOSFETs; Microwave FET integrated circuits; Microwave FETs; Microwave integrated circuits; Microwave transistors; Molecular beam epitaxial growth; Physics; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology, 2000, 2nd International Conference on. ICMMT 2000
Conference_Location :
Beijing
Print_ISBN :
0-7803-5743-4
Type :
conf
DOI :
10.1109/ICMMT.2000.895607
Filename :
895607
Link To Document :
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