• DocumentCode
    2784154
  • Title

    Hetero-junction microcrystalline silicon solar cells with wide-gap p-μc-Si1−xOx:H layer

  • Author

    Krajangsang, Taweewat ; Kasashima, Shunsuke ; Yunaz, Ihsanul Afdi ; Miyajima, Shinsuke ; Konagai, Makoto

  • Author_Institution
    Dept. of Phys. Electron., Tokyo Inst. of Technol., Tokyo, Japan
  • fYear
    2010
  • fDate
    20-25 June 2010
  • Abstract
    Preparation of p-type hydrogenated microcrystalline silicon oxide thin films (p-μc-Si1-xOx:H) by 13.56 MHz RF-PECVD method for use as a p-layer of hetero-junction μc-Si:H solar cells is presented. We investigated effects of wide-gap p-μc-Si1-xOx:H layer on the performance of hetero-junction μc-Si:H solar cells under various light intensity. We observed that a wide-gap p-μc-Si1-xOx:H is effective to improve the open circuit voltage of the solar cells. We also confirmed that the open circuit voltage (Voc) logarithmically increased with increasing the light intensity, and the enhancement of Voc improved with increasing the band gap of p-layer. These results indicate that wide-gap p-μc-Si1-xOx:H is promising for use as window layer in hetero-junction μc-Si:H solar cells.
  • Keywords
    energy gap; plasma CVD; semiconductor materials; semiconductor thin films; silicon compounds; solar cells; RF-PECVD method; SiO:H; band gap; frequency 13.56 MHz; heterojunction microcrystalline silicon solar cells; light intensity; open circuit voltage; p-layer; p-type hydrogenated microcrystalline silicon oxide thin films; wide-gap layer; Energy measurement; Films; Fires; Sun;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
  • Conference_Location
    Honolulu, HI
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-5890-5
  • Type

    conf

  • DOI
    10.1109/PVSC.2010.5617037
  • Filename
    5617037