• DocumentCode
    2784213
  • Title

    Correlation of a-Si:H properties with hydrogen distribution

  • Author

    Gaspari, Franco ; Shkrebtii, Anatoli ; Kupchak, Ihor ; Teatro, Tim ; Ibrahim, Zahraa A.

  • Author_Institution
    Inst. of Technol., Univ. of Ontario, Oshawa, ON, Canada
  • fYear
    2010
  • fDate
    20-25 June 2010
  • Abstract
    Hydrogenated amorphous silicon (a-Si:H) has been the subject of considerable studies in the past 30 years, due to its growing application in large area optoelectronic devices, and especially in solar cells (see, for instance). In particular, the microscopic details of disordering, hydrogen migration and bonding within the amorphous silicon network are crucial for the understanding of a-Si:H, including the detrimental Staebler-Wronski (SW) effect, and for the improvement of the overall quality of the material. The authors have recently developed and applied ab-initio Molecular Dynamics (AIMD) based computational tools in order to prepare and characterize "realistic" a-Si:H structures, which were used to simulate a variety of processes and to access their microscopic details. The goal of the current research is to extend the AIMD simulation to the derivation of the electronic density of states (DOS) and correlate the "goodness" of the material with hydrogen distribution. This work is a preliminary step to the simulation of technologically and fundamentally important hydrogen diffusion and silicon dangling bonds (DB) passivation processes.
  • Keywords
    Staebler-Wronski effect; amorphous semiconductors; dangling bonds; elemental semiconductors; hydrogen; optoelectronic devices; silicon; solar cells; Si:H; Staebler-Wronski effect; ab-initio molecular dynamics; dangling bonds; density of states; hydrogen diffusion; hydrogen distribution; hydrogenated amorphous silicon; optoelectronic devices; passivation processes; solar cells; Coordinate measuring machines;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
  • Conference_Location
    Honolulu, HI
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-5890-5
  • Type

    conf

  • DOI
    10.1109/PVSC.2010.5617040
  • Filename
    5617040