• DocumentCode
    2784307
  • Title

    Lithography, plasmonics and sub-wavelength aperture exposure technology

  • Author

    Ngu, Yves ; Peckerar, Marty ; Liu, Xiaoping ; Dagenais, Mario ; Messina, Mike ; Barry, John

  • Author_Institution
    Department of Electrical and Computer Engineering, University of Maryland, College Park, 20742, USA
  • fYear
    2007
  • fDate
    6-11 May 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report enhanced transmission of 250 nm radiation by sub-wavelength square aperture arrays on silver and demonstrate its use in optical lithography with far-reduced number of addressed pixels to produce very good edge acuity.
  • Keywords
    Apertures; Focusing; Image resolution; Lithography; Numerical analysis; Optical arrays; Plasmons; Resists; Silver; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics and Laser Science Conference, 2007. QELS '07
  • Conference_Location
    Baltimore, MD, USA
  • Print_ISBN
    978-1-55752-834-6
  • Type

    conf

  • DOI
    10.1109/QELS.2007.4431133
  • Filename
    4431133
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2784307