Design ranges for silicon multichannel neural probes

Author

Hetke, Jamille E. ; Anderson, David J. ; Wise, Kensall D.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA

Volume

1

fYear

1996

fDate

31 Oct-3 Nov 1996

Firstpage

266

Abstract

Semiconductor processing techniques are being utilized to fabricate multichannel electrodes for recording and stimulation in the central nervous system. These techniques allow precise control of a wide variety of design parameters. Probes 15 μm thick, 1.2 mm to 2.5 cm long and with shanks as narrow as 25 μm have been fabricated with up to 64 sites. This paper discusses the design parameter ranges, how they relate to characteristics of some of the existing designs and comments on some of the challenges which remain

Keywords

bioelectric phenomena; biological techniques; microelectrodes; neurophysiology; probes; semiconductor technology; silicon; 1.2 mm to 2.5 cm; 15 mum; 25 mum; Si; central nervous system recording; central nervous system stimulation; design parameters; design ranges; multichannel electrodes fabrication; neural prostheses; neurophysiological research; shanks; silicon multichannel neural probes; Boron; Dielectric materials; Dry etching; Electrodes; Engineering in Medicine and Biology Society; Fabrication; Probes; Shape; Silicon compounds; USA Councils;

fLanguage

English

Publisher

ieee

Conference_Titel

Engineering in Medicine and Biology Society, 1996. Bridging Disciplines for Biomedicine. Proceedings of the 18th Annual International Conference of the IEEE

Conference_Location

Amsterdam

Print_ISBN

0-7803-3811-1

Type

conf

DOI

10.1109/IEMBS.1996.656946

Filename

656946