Title :
Design ranges for silicon multichannel neural probes
Author :
Hetke, Jamille E. ; Anderson, David J. ; Wise, Kensall D.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fDate :
31 Oct-3 Nov 1996
Abstract :
Semiconductor processing techniques are being utilized to fabricate multichannel electrodes for recording and stimulation in the central nervous system. These techniques allow precise control of a wide variety of design parameters. Probes 15 μm thick, 1.2 mm to 2.5 cm long and with shanks as narrow as 25 μm have been fabricated with up to 64 sites. This paper discusses the design parameter ranges, how they relate to characteristics of some of the existing designs and comments on some of the challenges which remain
Keywords :
bioelectric phenomena; biological techniques; microelectrodes; neurophysiology; probes; semiconductor technology; silicon; 1.2 mm to 2.5 cm; 15 mum; 25 mum; Si; central nervous system recording; central nervous system stimulation; design parameters; design ranges; multichannel electrodes fabrication; neural prostheses; neurophysiological research; shanks; silicon multichannel neural probes; Boron; Dielectric materials; Dry etching; Electrodes; Engineering in Medicine and Biology Society; Fabrication; Probes; Shape; Silicon compounds; USA Councils;
Conference_Titel :
Engineering in Medicine and Biology Society, 1996. Bridging Disciplines for Biomedicine. Proceedings of the 18th Annual International Conference of the IEEE
Conference_Location :
Amsterdam
Print_ISBN :
0-7803-3811-1
DOI :
10.1109/IEMBS.1996.656946
