Title :
Measurement of piezoresistance coefficient with different gate voltages of GaN HEMT micro-accelerometer
Author :
Zhang, Qianqian ; Liang, Ting ; Tang, Jianjun ; Liu, Jun ; Xiong, Jijun ; Wang, Yong
Author_Institution :
Key Lab. of Instrum. Sci. & Dynamic Meas., North Univ. of China, Taiyuan, China
Abstract :
Through experiments and simulations, the piezoresistance coefficients of AlGaN/GaN HEMT under different gate voltages in the structure of micro-accelerometer are studied. The results show that piezoresistance coefficient at room temperature (RT) is equivalent to (2.47±0.04)×10-9 Pa-1, which is higher than that of silicon. The Current-Voltage characteristics of HEMT at different gate voltages were measured and the piezoresisitance coefficients under different temperatures were calculated. The conclusion is drawn that the drain saturation current and piezoresistance coefficient of HEMT decreases with the increase of the temperature. It has relation with the concentration of 2DEG and polarization effect.
Keywords :
III-V semiconductors; accelerometers; electric resistance measurement; gallium; high electron mobility transistors; piezoresistance; 2deg concentration; GaN; HEMT microaccelerometer; current-voltage characteristics; gate voltage; piezoresistance coefficient measurement; polarization effect; saturation current; temperature 293 K to 298 K; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; Piezoresistance; Temperature measurement; Voltage measurement; AlGaN/GaN HEMT; gate voltage; piezoresistance coefficient;
Conference_Titel :
Mechatronics and Automation (ICMA), 2011 International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-8113-2
DOI :
10.1109/ICMA.2011.5986340