A study of the self-assembled mono-layer deposition process for the anti-adhesion of nano-imprint stamps

The adhesion phenomenon of nano-imprint stamps will inevitably be one of the key issues for industrial applications of nano-imprint processes. The study of processes involving application of a thin film of chlorosilane on the surface of stamp that then attracts more and more attentions has resulted in documentation of promising solutions. However, the deposition of chlorosilane must be at under water-free atmosphere in order to achieve positive results. This study described below involves using a vacuum chamber and heating system designed to rapidly deposit high quality chlorosilane film onto silicon and nickel-based stamps through the vapor phase deposition method. The quality of anti-adhesion of the coated stamps has been investigated by imprinting experiments. The contact angles of the coated stamps after hundreds of imprints remain nearly the same as those of the as-deposited stamps.