DocumentCode :
2786145
Title :
Accuracy of single quantum dot registration using cryogenic laser photolithography
Author :
Lee, K.H. ; Green, A.M. ; Taylor, R.A. ; Waldermann, F.C. ; Sena, A. ; Sharp, D.N. ; Turberfield, A.J. ; Brossard, F.S.F. ; Williams, D.A.
Author_Institution :
Department of Physics, University of Oxford, Oxford, OX1 3PU, United Kingdom
Volume :
2
fYear :
2006
fDate :
17-20 June 2006
Firstpage :
723
Lastpage :
726
Abstract :
We have registered the position of single InGaAs quantum dots using a novel cryogenic laser photolithography technique. This would be useful in realizing solid state cavity quantum electrodynamics. By fabricating metal alignment markers around the quantum dot, it was registered with an accuracy of 50 nm. Following the marker fabrication process we demonstrated that the same quantum dot was reacquired, with an accuracy of 150 nm. The photoluminescence spectra from the quantum dots before and after processing were identical except for a small red shift (~1 nm), probably introduced during the reactive ion etching.
Keywords :
Nanotechnology; Photoluminescence; Quantum effect semiconductor devices; Cryogenics; Electrodynamics; Etching; Indium gallium arsenide; Lithography; Optical device fabrication; Photoluminescence; Quantum dot lasers; Quantum dots; Solid state circuits; Nanotechnology; Photoluminescence; Quantum effect semiconductor devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN :
1-4244-0077-5
Type :
conf
DOI :
10.1109/NANO.2006.247757
Filename :
1717207
Link To Document :
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