Title :
Semiconducting ²-FeSi2 for high efficiency and low cost photovoltaics
Author :
Kumar, Abhishek ; Chi, Dongzhi ; Verma, Lalit K. ; Danner, Aaron J. ; Yang, Hyunsoo ; Bhatia, Charanjit S.
Author_Institution :
Inst. of Mater. Res. & Eng., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Abstract :
The beta phase of iron disilicide, β-FeSi2, behaves as a semiconductor and possesses three desirable material properties: direct band gap of around 0.87 eV, close lattice match with silicon (2-4% mismatch) and abundant availability of its constituent elements on the earth´s crust. Moreover, its high optical absorption coefficient (one to two orders of magnitude higher than silicon) makes it a promising next generation semiconductor for photovoltaics with high performance and low environmental burden. The purpose of this work is to examine fundamental properties of β-FeSi2 material for application towards higher efficiency and low cost photovoltaics. Sputter deposition of Fe/Si multilayers was used to fabricate β-FeSi2 films. Conversion of the multilayer films to β-FeSi2 was accomplished by a thermal treatment under N2 atmosphere. β-FeSi2 films fabricated exhibited polycrystalline grains, with a direct energy band gap of 0.87 eV, an absorption coefficient in the order of 105 cm-1 and a residual carrier concentration due to electrons in the order of 1019 cm-3. Results of characterization using x-ray photoelectron spectroscopy, x-ray diffraction, scanning electron microscopy, UV-VIS-IR spectrophotometer measurements and Hall effect measurements have been discussed.
Keywords :
Hall effect; X-ray diffraction; X-ray photoelectron spectra; absorption coefficients; carrier density; energy gap; heat treatment; infrared spectra; iron compounds; multilayers; scanning electron microscopy; semiconductor materials; semiconductor thin films; solar cells; sputter deposition; ultraviolet spectra; visible spectra; FeSi2; IR spectra; UV spectra; absorption coefficient; carrier concentration; direct energy band gap; earth crust; iron disilicide; multilayer films; next generation semiconductor; photovoltaics; polycrystalline grains; residual carrier concentration; scanning electron microscopy; sputter deposition; visible spectra; x-ray diffraction; x-ray photoelectron spectroscopy; Absorption; Annealing; Iron; Optical films; Photonic band gap; Silicon;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-5890-5
DOI :
10.1109/PVSC.2010.5617187